lithography

What’s This Nano-Imprint Litho that Toshiba and SK hynix are Co-Developing?

BackToZero Sealing WaxLast week Toshiba and SK hynix announced an agreement to jointly develop Nano Imprint Lithography (NIL), building on a memorandum of understanding (MOU) that two companies signed in December last year.  Development efforts will begin this April and practical adoption is expected to start in 2017.  The collaboration is expected to reduce risk and accelerate commercialization of this technology.

NIL is expected to produce next-generation lithography at high throughput rates more economically than established lithography tools.  It is should compete against Extreme Ultraviolet (EUV) lithography, an alternative technology whose use has been delayed by numerous technical challenges.  EUV, a euphemism for X-Rays, cannot use transmissive optics like glass lenses, so a completely new reflective imaging technology has had to be developed to support its use.  The advantage of EUV is that the light wavelength is only 13nm, which is an order of magnitude smaller than the 193nm light currently used to produce leading-edge chips, allowing it to print significantly smaller features.

Unlike today’s lithography, which uses a purely photographic process, NIL mechanically stamps a pattern into the photoresist in a similar manner to the sealing wax stamp shown in the photo (courtesy of BackToZero, a wax stamp maker).  The stamp is produced using Continue reading

Why NAND is So Difficult to Scale

ASML chart chowing the lithography used for 4X, 3X, 2X, and 1Xnm planar NAND and 3D NANDNAND flash is the process leader in memory technology, and this puts it in a very challenging position: It must ramp to high volume production using techniques that have never been tried before.

The graphic for this post (click to enlarge), supplied by ASML, the semiconductor industry’s leading lithography tool supplier, illustrates the challenge of migrating from one process node to the next.  Across the bottom, on the X-axis, are representative process nodes ranging from “2D-45”, or two-dimensional (planar) 45nm NAND, to “3D-5x”, or three-dimensional 5xnm NAND.  Below these numbers are the year of volume production.

The vertical axis, labeled “Tolerance” represents the minimum Continue reading

3D NAND’s Impact on the Equipment Market

Costs to Migrate to Next Lithography Node - Applied Materials (click to enlarge)A very unusual side effect of the move to 3D NAND will be the impact on the equipment market.  3D NAND takes the pressure off of lithographic steps and focuses more attention on deposition and etch.  The reason for going to 3D is that it provides a path to higher density memories without requiring lithographic shrinks.

This sounds like bad news for stepper makers like ASML, Canon, and Nikon while it should be a boon to deposition and etch equipment makers like Applied Materials, Tokyo Electron, and Lam Research.

In its summer 2013 V-NAND announcement, Samsung explained that it would be Continue reading

Applied’s Take on 3D NAND

Applied Materials expects for 3D NAND to grow the etch & CVD markets by 50%Early this month I was invited to participate in Applied Materials’ (AMAT) Analyst Day.  The sessions were rich in data covering the markets that would profit the company over the next few years.

Naturally, The Memory Guy fixated on those presentations that dealt with memory.  When it came to the upcoming transition to 3D NAND, AMAT had a lot to say.

A later post will explain what 3D NAND actually is.  Suffice it to say that today’s approach to making NAND flash has nearly reached its limit, and the approach that manufacturers plan to use in the future involves making NAND strings that stand on their ends.  This has phenomenal implications on Continue reading

Contact

Jim Handy Objective Analysis Memory Market Research +1 (408) 356-2549 Jim.Handy (at) Objective-Analysis.com

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