CTF – The Memory Guy Blog

Videos Demystify MLC NAND Programming

What really happens in NAND flash during an MLC, TLC, or QLC write? Although there are lots of websites that explain that multilevel cells store four, or eight, or sixteen different voltage levels on a cell (for MLC, TLC, or QLC), they don’t spell out the process of putting those voltage levels onto the bit cell.

Fortunately, Vic Ye, Manager, NAND Flash Characterization at Yeestor Microelectronics Co., Ltd. in Shenzhen, China presented the programming process in a series of short videos at the Flash Memory Summit last August. The Memory Guy was fortunate enough to attend his presentation. Yeestor is a fabless semiconductor manufacturer that manufactures flash storage controllers for SSDs (PCIe & SATA) and flash cards (SD, UFS, eMMC, etc.)

Mr. Ye later gave me permission to share his videos and these are the foundation of this post. They’re brief (13 seconds to 1:10) so they won’t take much time to review. The videos were a part of his slide presentation titled: A Graphical Journey into 3D NAND Program Operations that can be downloaded from The Flash Memory Summit website by clicking the presentation title above and entering your e-mail address.

A multilevel flash bit cell has Continue reading “Videos Demystify MLC NAND Programming”

How Do You Erase and Program 3D NAND?

Some of my readers have asked: “How is 3D NAND programmed and erased? Is it any different from planar NAND?”

In a word: No.

(Before I get too far into this allow me to admit that The Memory Guy doesn’t understand quantum physics, so I will be presenting this only to the depth that I understand it. There will be no band-gap diagrams or equations to wrestle with.)

Both 3D NAND and planar NAND use Fowler Nordheim Tunneling (FN) to both program and erase. This differs from NOR flash which programs bits using Continue reading “How Do You Erase and Program 3D NAND?”

An Alternative Kind of Vertical 3D NAND String

My prior 3D NAND post explained how Toshiba’s BiCS cell works, using a silicon nitride charge trap to substitute for a floating gate. This post will look at an alternative technology used by Samsung and Hynix which is illustrated in the first graphic, a diagram Samsung presented at a technical conference. This cell also uses a charge trap.

Let The Memory Guy warn you, if the process in my prior post seemed tricky, this one promises to put that one to shame!

Part of this stems from the use of a different kind of NAND bit cell. You can shrink flash cells smaller if you use a high-k gate dielectric (one with a high dielectric constant “k”) since it Continue reading “An Alternative Kind of Vertical 3D NAND String”

3D NAND: Making a Vertical String

Let’s look at how one form of 3D NAND is manufactured. For this post we will explore the original design suggested by Toshiba at the IEEE’s International Electron Device Meeting (IEDM) in 2007. It’s shown in the first graphic of this post. (Click on any of the graphics for a better view.)

Toshiba calls this technology “BiCS” for “Bit Cost Scaling.” The technique doesn’t scale the process the way the world of semiconductors has always done to date – it scales the cost without shrinking the length and width of the memory cell. It accomplishes this by going vertically, as is shown in this post’s first graphic.

This takes a special effort. This is where the real Continue reading “3D NAND: Making a Vertical String”