This is Part 2 of a short Memory Guy series in which contributor Ron Neale continues to explore the possible future impact on PCM memory performance, especially write/erase endurance, building on the results of the IBM/Yale University analysis outlined in Part 1.
After, in Part 1, summarizing the methodology my next step was to try to bring together in another simple diagram all the detail of the complexity of the movement of the different elements of the phase change memory material at different locations within the memory cell which the IBM/Yale work has disclosed. Movement which leads to the conclusion that bi-polar operation would be means of extending PCM endurance.
In this post’s first diagram (below) the central region provides illustration of the paper’s unique PCM device structure: A high aspect ratio tapered cell lined with a metal conductor. With the two-state memory switching region located (red coloured) roughly at the centre of the taper. This means that, Continue reading “Extending the Write/Erase Lifetime of Phase Change Memory: Part 2 – A More Complete View of Element Separation”