How Samsung Will Improve 3D NAND Costs

Samsung's New Stairstep Etch iOne of the most intriguing revelations during the Flash Memory Summit two weeks ago was Samsung’s new approach to stairstep etch in 3D NAND.  This was one of numerous innovations the company’s  EVP of Flash Products & Technologies, Kye Hyun (KH) Kyung, shared during Samsung’s Tuesday Morning keynote presentation.

The Memory Guy would point readers to the pdf of Samsung’s presentation on the Flash Memory Summit website, but it isn’t there, and it’s unlikely to ever be posted there.  Samsung seems to have a policy that prohibits sharing such presentations.

Although I was unable to get a copy of the drawing that the keynoter used, I have tried to re-create it using, of all things, Excel!  The result is the graphic for this blog post.  The only thing I was unable to easily recreate was the different colors representing the layers of the 3D NAND.  You’ll need to use your imagination and envision layers of two colors, with all the surfaces exposed on the top being the same color, but at different layers of a 64-layer structure.

Today’s common approach to 3D NAND’s stairstep is to etch a simple step pattern in one dimension, which I illustrated in an early 3D NAND blog post four years ago.  This is a challenging Continue reading “How Samsung Will Improve 3D NAND Costs”

Samsung Power Glitch – Is It Important?

3D NANDOn Saturday, June 18, Samsung’s Xian fab, the only facility in the world currently producing 3D NAND flash, suffered a power failure.  How much of a problem is this?

The answer really depends upon who you ask.  An article in the Financial Express quoted Samsung as saying that it would have a minimal impact, and that full-scale operations should resume in a few days.  The article also said that Samsung estimated that the wafer loss would be below 10,000 wafers.

Assuming that the entire loss consisted of Samsung’s most advanced 48-layer 256Gb 3D NAND a 10,000-wafer loss would be less than 1% of total industry gigabyte shipments.

Korea Times quoted an anonymous fund manager who said: “The one-time incident will cost Samsung up to 20 billion won, which is very minimal.  It won’t make heavy impact on Samsung’s chip business and the entire industry.”

According to Korean news source Chosenilbo the outage was caused by Continue reading “Samsung Power Glitch – Is It Important?”

Four New Players Join 3D NAND Market

Micron & Intel's 3D NAND Die PhotoThe following is excerpted from an Objective Analysis Alert sent to our clients on March 26: On March 25 SanDisk and Toshiba announced sampling of their 3D NAND flash technology, a 128Gb (gigabit) 48-layer second-generation product based on the BiCS technology that the companies pioneered in 2007.  Pilot production will begin in the second half of 2015 with meaningful production targeted for 2016. This release was issued at the same time that Intel and Micron were briefing the press and analysts for their March 26 announcement of their own 3D NAND offering (pictured), which is currently sampling with select customers, and is to enter full production by year-end.  The Micron-Intel chip is a 32-layer 256Gb device, which the companies proudly point out is the densest flash chip in the industry.

Similarities and Differences

These two joint ventures (Intel-Micron and SanDisk-Toshiba) are taking very different Continue reading “Four New Players Join 3D NAND Market”

Finally! Samsung’s 3-Bit V-NAND Arrives

3-bit V-NANDSamsung has finally introduced the 3-bit 3D NAND chip it revealed at last August’s Flash Memory Summit.  This announcement was made in the form of an SSD announcement.

For those who were unable to attend the Flash Memory Summit, Samsung’s Senior VP of Memory R&D, Bob Brennan, announced in his keynote speech that a 3D 32-layer V-NAND, a chip that would achieve twice the chip density of planar NAND, was entering production and that SSDs would follow in a month.  Now, two months later, Samsung has announced those SSDs.

This week’s release reiterates Continue reading “Finally! Samsung’s 3-Bit V-NAND Arrives”

New Book: Vertical 3D Memory Technologies

Book: Vertical 3D Memory Technologies - Betty PrinceWiley has recently published a new book by Betty Prince titled Vertical 3D NAND Technologies that is one to consider if you want to bring yourself up to speed on recent research behind today’s and tomorrow’s 3D memory technologies.

For those who haven’t previously encountered Dr. Prince, she is the author of a number of key books covering memory design and holds memory patents written over her 30-year career in the field.

The book provides capsule summaries of over 360 papers and articles from scholarly journals on the subject of 3D memories, including DRAM, NAND flash, and stacked chips.

These papers are organized into Continue reading “New Book: Vertical 3D Memory Technologies”

Making 3D NAND Flash – Animated Video

The good people at Coventor have graciously allowed me to post their video of the Pipe-Shaped BiCS 3D NAND flash process onto The Memory Guy blog site.  Click the image to see it play out.

Coventor tells me that they are the leading Continue reading “Making 3D NAND Flash – Animated Video”

Samsung Begins Operations at its Xi’an Fab

Samsung's Xi'an, China fabSamsung has announced that the company’s newest memory fabrication plant (Fab) in Xi’an, China has “begun full-scale production operations”, adding that: “The new facility will manufacture Samsung’s advanced NAND flash memory chips: 3D V-NAND.”

I immediately asked whether the plant will build products other than 3D NAND, and the company has replied that this will be the only product produced in the Xi’an plant.  What Samsung has not said is what is meant by “full-scale production operations.”  Typically wafer fabs start with a very low production capacity as new tools are being qualified, only ramping to high-volume production a year or more after initial production.

Samsung points out that production has begun a mere 20 months after initial groundbreaking, which is quite Continue reading “Samsung Begins Operations at its Xi’an Fab”

Comparing Samsung V-NAND to Micron 16nm Planar NAND

Andrew Walker, SchiltronI was recently directed to a very interesting blog post written by 3D technologist Andrew Walker of Schiltron in which he compares two NAND flash chips that were presented at the IEEE International Solid State Circuits Conference (ISSCC) on February 12.

The post, titled Samsung’s V-NAND Flash at the 2014 ISSCC: Ye Distant Spires… is on the 3D InCites website.

Dr. Walker puts a lot more time and effort into his graphic representations of 3D NAND chips than do others (The Memory Guy included) and this makes it much easier to understand the issues he points out.  He shows us that Samsung’s 3D NAND cell is about 5 times the size of a 40nm planar NAND cell and about 30 times that of Micron’s 16nm planar cell, and that the 3D NAND’s physical area is unlikely to change with any future 3D technology generations.

For this and other reasons (given in the article) he states that the Samsung V-NAND is “an impressive achievement but not a realistic foundation for the future.”

After having compiled my series on 3D NAND I can appreciate Dr. Walker’s opinion.  This is certainly going to be a difficult technology to master, and it could be quite some time before the cost structure for 3D NAND can compete against that of today’s planar technologies.

Give the Walker post a quick read and judge for yourself whether we are at the brink of a 3D conversion or if this technology can be expected to slip out a few years.

Why NAND is So Difficult to Scale

ASML chart chowing the lithography used for 4X, 3X, 2X, and 1Xnm planar NAND and 3D NANDNAND flash is the process leader in memory technology, and this puts it in a very challenging position: It must ramp to high volume production using techniques that have never been tried before.

The graphic for this post (click to enlarge), supplied by ASML, the semiconductor industry’s leading lithography tool supplier, illustrates the challenge of migrating from one process node to the next.  Across the bottom, on the X-axis, are representative process nodes ranging from “2D-45”, or two-dimensional (planar) 45nm NAND, to “3D-5x”, or three-dimensional 5xnm NAND.  Below these numbers are the year of volume production.

The vertical axis, labeled “Tolerance” represents the minimum Continue reading “Why NAND is So Difficult to Scale”

3D NAND’s Impact on the Equipment Market

Costs to Migrate to Next Lithography Node - Applied Materials (click to enlarge)A very unusual side effect of the move to 3D NAND will be the impact on the equipment market.  3D NAND takes the pressure off of lithographic steps and focuses more attention on deposition and etch.  The reason for going to 3D is that it provides a path to higher density memories without requiring lithographic shrinks.

This sounds like bad news for stepper makers like ASML, Canon, and Nikon while it should be a boon to deposition and etch equipment makers like Applied Materials, Tokyo Electron, and Lam Research.

In its summer 2013 V-NAND announcement, Samsung explained that it would be Continue reading “3D NAND’s Impact on the Equipment Market”