3D NAND - The Memory Guy Blog

Why NAND is So Difficult to Scale

NAND flash is the process leader in memory technology, and this puts it in a very challenging position: It must ramp to high volume production using techniques that have never been tried before.

The graphic for this post (click to enlarge), supplied by ASML, the semiconductor industry’s leading lithography tool supplier, illustrates the challenge of migrating from one process node to the next. Across the bottom, on the X-axis, are representative process nodes ranging from “2D-45”, or two-dimensional (planar) 45nm NAND, to “3D-5x”, or three-dimensional 5xnm NAND. Below these numbers are the year of volume production.

The vertical axis, labeled “Tolerance” represents the minimum Continue reading “Why NAND is So Difficult to Scale”

What is a “Multilayer Cell”?

From time to time I get questions from investors in the memory business asking: “What is a multilayer cell?”

The answer is: “There is no such thing: It’s a misstatement.”

The term “MLC” has, by a number of people, been mistranslated to “multi-layer cell.” The misunderstanding appears to have originated in the financial community. People in the flash memory business never use the term at all.

Yes, we talk about MLC, but to us the term means “multilevel cell”.

A multilevel cell is a cell that uses varying voltage levels to represent different states. With four voltage levels the resulting four states on a single cell can be turned into Continue reading “What is a “Multilayer Cell”?”

Samsung’s View on Charge Trap Flash

At the Flash Memory Summit yesterday ES Jung, PhD, EVP & GM for the Samsung R&D Center, explained the inner workings of Samsung’s new V-NAND vertical NAND flash technology. I will shortly be writing a series to explain what a 3D NAND is since there is little on the web that gives clear details about the technology.

One key attribute of most 3D NAND approaches is the use of a charge trapping layer. This has to do with the difficulty of manufacturing sideways floating gates.

Dr Jung delighted the show’s audience by explaining that a standard floating gate is like Continue reading “Samsung’s View on Charge Trap Flash”

Samsung Announces 3D NAND Production

Samsung has announced production of its 3D NAND technology. This approach, first introduced by Toshiba in 2007, allows NAND flash makers to achieve more bits per chip by building NAND strings, which normally run across the surface of the chip, as vertical stacks.

It’s a fascinating technology, since it harnesses exotic steps invented by DRAM makers in the 1990s to get over scaling problems in that technology. At the time DRAM had to go vertical to follow Moore’s Law and there were two schools of vertical DRAM: Stacked Capacitor, and Trench Cell. The stacked capacitor camp layered polysilicon and silicon dioxide into layers to form a vertical capacitor. The trench camp etched a very narrow and deep hole into the silicon and lined it with the capacitor plates. Both worked very well, but over time the trench makers have Continue reading “Samsung Announces 3D NAND Production”

Applied’s Take on 3D NAND

Early this month I was invited to participate in Applied Materials’ (AMAT) Analyst Day. The sessions were rich in data covering the markets that would profit the company over the next few years.

Naturally, The Memory Guy fixated on those presentations that dealt with memory. When it came to the upcoming transition to 3D NAND, AMAT had a lot to say.

A later post will explain what 3D NAND actually is. Suffice it to say that today’s approach to making NAND flash has nearly reached its limit, and the approach that manufacturers plan to use in the future involves making NAND strings that stand on their ends. This has phenomenal implications on Continue reading “Applied’s Take on 3D NAND”